X-ray Raman scattering studies of Si based compounds under extreme conditions

Sahle, C. J.; Sternemann, C.; Tse, J. S.; Wilke, Max; Schmidt, Christian; Nyrow, A.; Dubrail, J.; Giordano, V.; Simonelli, L.; Desgreniers, S.; Tolan, M.

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X-ray Raman scattering studies of Si based compounds under extreme conditions

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Sahle, C. J.
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Sternemann, C.
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Tse, J. S.
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Wilke, Max
3.3 Chemistry and Physics of Earth Materials, 3.0 Geodynamics and Geomaterials, Departments, GFZ Publication Database, Deutsches GeoForschungsZentrum;

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Schmidt, Christian
3.3 Chemistry and Physics of Earth Materials, 3.0 Geodynamics and Geomaterials, Departments, GFZ Publication Database, Deutsches GeoForschungsZentrum;

Nyrow, A.
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Dubrail, J.
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Giordano, V.
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Simonelli, L.
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Desgreniers, S.
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Tolan, M.
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Sahle, C. J., Sternemann, C., Tse, J. S., Wilke, M., Schmidt, C., Nyrow, A., Dubrail, J., Giordano, V., Simonelli, L., Desgreniers, S., Tolan, M. (2010): X-ray Raman scattering studies of Si based compounds under extreme conditions, 7th International Conference on Inelastic X-ray Scattering - IXS 2010 (Grenoble, France 2010).

https://gfzpublic.gfz-potsdam.de/pubman/item/item_242290

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